A critical examination of Huawei's recent EUV lithography patent that challenges ASML's market leadership in semiconductor manufacturing equipment. The patent showcases Huawei's advanced capabilities in 13.5nm EUV light generation, reflecting mirrors, and control systems. This development comes amid US restrictions on China's access to foreign chip-making tools and could reshape the semiconductor industry landscape. The analysis covers the technical complexities of EUV machines, market projections, and China's broader push toward semiconductor independence, with potential implications for global tech supply chains.

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