ASML's High-NA extreme ultraviolet chipmaking tool called High-NA Twinscan EXE will cost around $380 million each. over twice as much as its existing Low-NA EUV lithography systems that cost about $183 million.
The High-NA EUV technology represents a major breakthrough enabling an improved 8nm imprint resolution compared to 13nm with current Low-NA EUV tools. This allows chipmakers to produce transistors that are nearly 1.7 times smaller translating to a threefold increase in transistor density on chips.
